Area-Selective Etching of Poly(methyl methacrylate) Films by

Selective-Area Atomic Layer Deposition Using Poly(methyl methacrylate) Films as Mask Layers

Polymer masks for structured surface and plasma etching - ScienceDirect

Area-Selective Deposition of Ruthenium by Combining Atomic Layer Deposition and Selective Etching

Low Temperature Area Selective Atomic Layer Deposition of Ruthenium Dioxide Thin Films Using Polymers as Inhibition Layers - Poonkottil - 2023 - Advanced Materials Interfaces - Wiley Online Library

Polymers, Free Full-Text

Polymers, Free Full-Text

Area-Selective Etching of Poly(methyl methacrylate) Films by Catalytic Decomposition

A top surface imaging method using area selective ALD on chemically amplified polymer photoresist films

Patterning two‐dimensional semiconductors with thermal etching - Liu - InfoMat - Wiley Online Library

Nanomaterials, Free Full-Text

Selective-Area Atomic Layer Deposition Using Poly(methyl methacrylate) Films as Mask Layers

Effect of SIS treatment on the etch resistance of PMMA and ZEP520A. (a)

Preparation of porous polyimide films by selective decomposition of poly(methyl methacrylate) from PI/PMMA-blended films - Hua-Zhen Zhou, Mao-Sheng Zhan, Kai Wang, Xiao-Yan Liu, 2013

Left) SIS lithography using block copolymer. a) Self-assembled